Calculating differential scattering parameters

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system

Reexamination Certificate

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C324S638000, C702S066000, C703S014000

Reexamination Certificate

active

07127363

ABSTRACT:
In one embodiment, the present invention includes a method for simulating a first stimulus into a device under test and measuring first single-ended scattering parameters caused thereby, and directly calculating a differential scattering parameter from the first single-ended scattering parameters. In certain embodiments, second single-ended scattering parameters may be obtained from a second stimulus into the device under test, and the results used to calculate the differential scattering parameter, for example, where a device under test is non-homogeneous.

REFERENCES:
patent: 4816767 (1989-03-01), Cannon et al.
patent: 5025402 (1991-06-01), Winkelstein
patent: 6653848 (2003-11-01), Adamian et al.
“Using Single-ended S-matrices to Characterize Differential Components in Mobile Radio Design”. Lee, Sang Jin. www.rfdesign.com. RF signal processing, pp. 14-18. Apr. 1, 2003.
“On-wafer differential/multi-port characterization solution”. http://www.cascademicrotech.com/pubs/DIFF-QA.pdf. Cascade Microtech Q&A, Jun. 2002.

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