Superconductor technology: apparatus – material – process – High temperature devices – systems – apparatus – com- ponents,... – Substrate for supporting superconductor
Patent
1994-04-12
1995-05-23
Ryan, Patrick J.
Superconductor technology: apparatus, material, process
High temperature devices, systems, apparatus, com- ponents,...
Substrate for supporting superconductor
428688, 428689, 428700, 505701, 505238, B32B 900
Patent
active
054182158
ABSTRACT:
c-axis oriented microwave quality HTSC films are deposited onto single crystals of gadolinium gallium garnet (GGG) using pulsed laser deposition (PLD) with conditions of 85 mTorr of oxygen partial pressure, a block temperature of 730.degree. C., a substrate surface temperature of 790.degree. C. and a laser fluence of 1 to 2 Joules/cm.sub.2 at the target, a laser repetition rate of 10 Hz and a target to substrate distance of 7 cm and in which the a and b lattice parameters of the GGG exhibit a mismatch of less than 2.5 percent with the a and b lattice parameters of the HTSC.
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Tauber Arthur
Tidrow Steven C.
Gordon Roy E.
Jewik Patrick
Ryan Patrick J.
The United States of America as represented by the Secretary of
Zelenka Michael
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