Fluid handling – Processes
Reexamination Certificate
2006-11-21
2006-11-21
Krishnamurthy, Ramesh (Department: 3753)
Fluid handling
Processes
C137S486000, C137S487500, C073S001160, C702S100000
Reexamination Certificate
active
07137400
ABSTRACT:
Described herein are apparatuses, methods and systems to monitor the performance of one or more mass flow controllers that supply gases to deposition, etching, and other manufacturing processes. A bypass loop is provided in fluid connection from either the process line or the vent line. In the bypass loop is a flow detector, such as a digitized mass flow controller. The flow detector takes one or more measurements of flow of gas from a mass flow controller, and data from such one or more measurements is used to provide information about the accuracy and/or precision of the mass flow controller. Also disclosed are ways to correct for back pressure or back vacuum in the process line.
REFERENCES:
patent: 5684245 (1997-11-01), Hinkle
patent: 5744695 (1998-04-01), Forbes
patent: 5865205 (1999-02-01), Wilmer
patent: 5975126 (1999-11-01), Bump et al.
patent: 6119710 (2000-09-01), Brown
patent: 6273954 (2001-08-01), Nishikawa et al.
patent: 6332348 (2001-12-01), Yelverton et al.
Bevers William Daniel
Buckfeller Joseph William
Flack James L.
Jones Robert Francis
Ross Bennett J.
Agere Systems Inc.
Krishnamurthy Ramesh
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