By-product collecting processes for cleaning processes

Details By-product collecting processes for cleaning processes By-product collecting processes for cleaning processes

2006-10-12

2011-11-08

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C216S071000, C156S345330, C156S345410, C156S345480, C134S001100, C134S030000

Reexamination Certificate

active

08052799

ABSTRACT:
An apparatus and a method for operating the same. The method includes providing an apparatus which includes a chamber, wherein the chamber includes first and second inlets, an anode and a cathode structures in the chamber, and a wafer on the cathode structure. A cleaning gas is injected into the chamber via the first inlet. A collecting gas is injected into the chamber via the second inlet. The cleaning gas when ionized has a property of etching a top surface of the wafer resulting in a by-product mixture in the chamber. The collecting gas has a property of preventing the by-product mixture from depositing back to the surface of the wafer.

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