Buried reverse bias junction configurations in semiconductor str

Fishing – trapping – and vermin destroying

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437129, 437133, 437173, 437915, 148DIG51, 148DIG71, 148DIG95, H01L 2120

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055630944

ABSTRACT:
In situ removal of selected or patterned portions of semiconductor layers is accomplished by induced evaporation enhancement to form reversed bias current confinement structures in semiconductor devices, such as heterostructure lasers and array lasers.

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