Bulk image modeling for optical proximity correction

Details Bulk image modeling for optical proximity correction Bulk image modeling for optical proximity correction

2011-08-23

2011-08-23

Kik, Phallaka (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Manufacturing optimizations

C716S055000, C716S051000, C716S111000, C716S136000, C700S098000, C700S121000, C700S120000, C430S005000, C378S035000, C382S144000, C382S145000, C382S154000

Reexamination Certificate

active

08006203

ABSTRACT:
A method is described herein for predicting lateral position information about a feature represented in an integrated circuit layout for use with an integrated circuit fabrication process, where the process projects an image onto a resist. The method includes providing a lateral distribution of intensity values of the image at different depths with the resist. Next, the lateral position of an edge point of the feature is predicted in dependence upon a particular resist development time, and further in dependence upon the image intensity values at more than one depth within the resist.

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