Fluent material handling – with receiver or receiver coacting mea – Combined
Reexamination Certificate
1999-06-08
2001-07-17
Jacyna, J. Casimer (Department: 3751)
Fluent material handling, with receiver or receiver coacting mea
Combined
C141S001000, C141S021000, C141S097000, C141S231000, C137S377000
Reexamination Certificate
active
06260588
ABSTRACT:
BACKGROUND OF INVENTION
This invention generally pertains to a system for delivering chemicals such as tetraethylorthosilicate (TEOS) from bulk delivery canisters to manufacturing process tools such as chemical vapor deposition (CVD) devices.
The production of electronic devices such as integrated circuits is well known. In certain steps in such production, chemical may be fed to certain process tools which use the chemical. For instance, a CVD reactor is commonly employed to generate a layer of a given material, such as a layer of amorphous silicon oxide from TEOS. Historically, the TEOS was fed to the CVD reactor via bulk delivery cabinets utilizing 5 or 10 gallon canisters. The increase in consumption of TEOS has increased significantly due to increased metal layers and 300 mm processes. The more complex processes on larger wafers have also put pressure on the economics of each layer. 200 liter canisters allow for economies of scale savings that are passed on to the customer. In addition, the larger bulk canister reduces the number of container changes, labor, and shipping costs. In view of an increase in TEOS requirements for manufacturing operations, a need exists for a system which supplies an uninterrupted stream of chemicals to multiple process tools. Similarly, since existing fabrication facilities routinely change out canisters at each cabinet, and since each replacement results in potential contamination of the system, it would be desirable to reduce the number of contamination points. In addition, the present inventors have identified that a need exists for a delivery cabinet that reduces the potential for fires or explosions due to electrical sparks that ignite chemical vapor that may be present in the cabinet.
SUMMARY OF INVENTION
The present invention provides a solution to one or more of the disadvantages and needs addressed above.
In one respect, the present invention is a chemical supply system, comprising: a cabinet that houses a delivery system, wherein the delivery system comprises: a canister within the cabinet that is connected to a manifold within the cabinet that includes at least one output line for providing chemical from the canister outside the cabinet, an input system that provides input for operation of the delivery system, wherein the input system is housed in an enclosure, an inert gas line that connects and supplies inert gas to the enclosure. The supply system may include at least one outlet line that connects to a valve manifold box. Also, the supply system may include at least one outlet line that connects to a process tool. Alternatively, the supply system may include at least one outlet line that connects to a valve manifold box that connects to a secondary canister. In one embodiment, the canister has a capacity of at least about 200 liters. The canister may optionally be housed in a transportation cart. In another embodiment, the supply system includes a control box housed in the cabinet. The control box may house a programmable controller which controls the flow of chemical through the system. The input system may be a touch screen. Alternatively, the enclosure that houses the input system may also house control instrumentation. In one embodiment, the line from the enclosure provides inert gas to the control box.
In another broad respect, this invention is a process useful for providing a chemical to a process tool that is used in the fabrication of electronic devices, comprising: directly or indirectly supplying a chemical to a process tool from a the supply system comprising: a cabinet that houses a delivery system, wherein the delivery system comprises: a canister within the cabinet that is connected to a manifold within the cabinet that includes at least one output line for providing chemical from the canister outside the cabinet, an input system that provides input for operation of the delivery system, wherein the input system is housed in an enclosure, an inert gas line that connects and supplies inert gas to the enclosure.
In another broad respect, this invention is a process for the production of a supply system comprising: installing a delivery system in a cabinet, wherein the delivery system comprises: a canister within the cabinet that is connected to a manifold within the cabinet that includes at least one output line for providing chemical from the canister outside the cabinet, an input system that provides input for operation of the delivery system, wherein the input system is housed in an enclosure, an inert gas line that connects and supplies inert gas to the enclosure.
The system may enable supply of large scale high purity liquid chemicals to multiple process tools such as multiple CVD reactors. By way of illustration, in the embodiment of this invention depicted in
FIGS. 1 and 1A
, by including four valve manifold boxes which each feed chemical to four cabinets which each have four output lines, the system may provide chemicals to 64 process tools. It should be appreciated, however, that the number of exit lines from the manifold boxes, bulk cabinet, and secondary cabinet may vary widely, and any number of exit lines may be used. It is also contemplated that one or more additional manifold boxes may be used in series to further split the chemical feed.
In another broad respect, this invention is a process useful for providing a chemical to a process tool that is used in the fabrication of electronic devices, comprising: supplying a chemical to a process tool from a secondary canister that is fed chemical from a valve manifold box which is supplied chemical by a bulk canister. In one embodiment, the bulk canister has a capacity of about 200 liters and wherein the secondary canister has a smaller capacity than the bulk canister. In one embodiment, the chemical is tetraethylorthosilicate. In one embodiment, a second bulk canister optionally provides chemical to the valve manifold box, either directly or indirectly through a manifold connected to a bulk canister.
As used herein, “process tool” refers to a process tool which ultimately uses the chemical provided by the system of this invention. The system of this invention may thus provide chemicals to any process tool which requires a chemical during its use. Such process tools may include apparatuses for chemical vapor deposition, photolithography, and etch applications. These process tools are frequently used in the fabrication of electronic devices such as integrated circuits, memory circuits, flat panel display, possibly fiber optic manufacturing, multichip modules (e.g., “MCMs”), and so forth. In addition, it should be appreciated that while this invention may be used to supply a chemical such as TEOS to a process tool such as a CVD reactor used in the fabrication of integrated circuits, memory devices, and the like, the system may be used in other processes.
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patent: 5
Esser Craig
Gregg John N.
Jackson Robert M.
Noah Craig M.
Advanced Technology & Materials Inc.
Jacyna J. Casimer
O'Keefe Robert M.
Zitzmann Oliver A. M.
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