Buffer layer in flat panel display

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Forming nonelectrolytic coating after forming nonmetal...

Reexamination Certificate

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C216S095000, C216S102000, C204S192220, C205S201000, C205S223000, C205S324000, C205S325000

Reexamination Certificate

active

09960912

ABSTRACT:
In devices such as flat panel displays, an aluminum oxide layer is provided between an aluminum layer and an ITO layer when such materials would otherwise be in contact to protect the ITO from optical and electrical defects sustained, for instance, during anodic bonding and other fabrication steps. This aluminum oxide barrier layer is preferably formed either by: (1) partially or completely anodizing an aluminum layer formed over the ITO layer, or (2) an in situ process forming aluminum oxide either over the ITO layer or over an aluminum layer formed on the ITO layer. After either of these processes, an aluminum layer is then formed over the aluminum oxide layer.

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