Brush conditioner for a semiconductor cleaning brush

Details Brush conditioner for a semiconductor cleaning brush Brush conditioner for a semiconductor cleaning brush

1996-06-28

1998-05-05

Chin, Randall

Brushing, scrubbing, and general cleaning

Machines

Brushing

15 211, 15 883, 1525652, B08B 1100

Patent

active

057459452

ABSTRACT:
Disclosed is a brush conditioning apparatus for attachment to a wafer cleaning tool having a cylindrical brush. The brush conditioning apparatus includes a freely rotatable, cylindrically shaped brush conditioner that can be adjustably mounted onto an existing wafer cleaning tool. The apparatus also includes a fluid injection system that has an intake port on at least one end of the cylindrical brush conditioner and includes fluid dispensing outlets along the radial surface of the brush conditioner. Because the brush conditioner is freely mounted onto the brush cleaning tool and in contact with the cleaning brush, a counter rotation of the brush conditioner will occur as the cleaning brush is rotated.

REFERENCES:
patent: 1529691 (1925-03-01), Davis
patent: 2541301 (1951-02-01), Sissler
patent: 3120805 (1964-02-01), Simon
patent: 3278972 (1966-10-01), Hudson
patent: 3656200 (1972-04-01), Riley, Jr.
patent: 3766593 (1973-10-01), Becker et al.
patent: 4172303 (1979-10-01), Wooding
patent: 4475807 (1984-10-01), Toyoda
patent: 4566911 (1986-01-01), Tomita et al.
patent: 5103525 (1992-04-01), Nakayama
patent: 5384931 (1995-01-01), Hanson

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