Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1989-03-20
1990-05-08
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
20415799, 2041581, B01J 1908
Patent
active
049235800
ABSTRACT:
Selective bromination of alkylarenes to the alpha dibrominated derivative is desirable as a precursor for the selective production of, for example, the corresponding aromatic aldehyde.
Improvements in the extent of selectivity of the product and/or its rate of production can be obtained by employing a photolytic reaction between the substrate, hydrogen peroxide and hydrogen bromide using mole ratios of H.sub.2 O.sub.2 : substrate of about 2.8:1 or higher, preferably 3,2: to 3.5:1 and of bromide:substrate of over 2.5:1, preferably about 2.8:1 to 3.2:1 and progressive controlled introduction of the H.sub.2 O.sub.2, the reaction being carried out in the presence of a substantial amount of an organic solvent, and preferably more than 5.5 volumes per volume of substrate, whilst irradiating with light preferably having principal emissions in the range of 250 to 600 nm. The reaction mixture is preferably maintained at 50.degree. to 60.degree. C. The reaction often takes from 5 to 12 hours, of which period hydrogen peroxide is introduced progressively into the reaction mixture during preferably the first 3 to 5 hours. The process is especially suitable for deactivated alkylarenes, such as o-nitrotoluene.
REFERENCES:
patent: 4165268 (1979-08-01), Marti
patent: 4191621 (1980-03-01), Riethmann
Jeff Martin
Reeve Kevan M.
Turner Philip J.
Hsing Ben C.
Interox Chemicals Limited
Niebling John F.
LandOfFree
Bromination does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Bromination, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bromination will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2347368