Broad high current ion source

Details Broad high current ion source Broad high current ion source

1995-03-07

1996-11-19

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511141, 31511161, 31323131, 3133591, 250427, 250423R, H01J 724

Patent

active

055766005

ABSTRACT:
An ion source has a peripheral wall, a back face and a front face which together define a plasma chamber extending along an axis. In one embodiment, a central aperture emits ions from plasma formed in a generally annular containment band about the aperture, and a plurality of magnets define magnetic field lines extending into the band, so that electrons traveling from the cathode are trapped in the band and highly effective ionization is achieved, producing high beam currents. An anode at the back of the source expels ions from the central region. In another or further embodiment, the plasma chamber has an anode plate which extends across the back of the source, and provides a broad expulsion field for expelling and preferably shaping a high current in ion output beam. A fluid inlet introduces an ionizable fluid in the peripheral region to interact with the trapped electrons, generating plasma with high efficiency. In a preferred embodiment, the anode plate channels the incoming fluid to the peripheral band directing it into the electron region to reach the aperture. In various constructions, the magnets are arranged in pairs to provide opposite poles adjacent each other extending entirely around the annulus. The north-south poles of the pairs of magnets may be arrayed along the inner face of the front plate, the inside face of the peripheral wall, or may be arrayed on both front and side surfaces to define magnetic lines extending diagonally across the peripheral band. Preferably, the magnets are mounted on a ring of magnetic material, and the ring is cooled so that it positions and orients the magnetic field lines while cooling the magnets by direct thermal contact. A cover plate of electrically conductive but non-magnetic material shields all of the magnets and defines a smooth continuous inner wall of the plasma chamber. Robust materials may be used for other components, such as steel or iron for the various plates, anode, and walls. In a preferred embodiment the anode is cooled by fluid circulating through internal passages thereof.

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