Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2005-11-30
2008-08-19
Berman, Jack I (Department: 2881)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
C250S492210, C335S213000
Reexamination Certificate
active
07414249
ABSTRACT:
A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.
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Optics of Charged Particles; Hermann Wollnik; 6-pages; 282-287.
Purser Kenneth H.
Turner Norman L.
Berman Jack I
Nields & Lemack
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