Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent
1993-04-29
1995-12-26
Dang, Thi
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
216100, 134 3, 134 41, 148226, 148233, C23F 100
Patent
active
054779766
ABSTRACT:
A brightening chemical polishing solution for a hardened steel article (e.g., a carburized and quenched gear) comprises hydrofluoric acid having a molar concentration of from 0.2 to 2 mol/l, hydrogen peroxide having a molar concentration of from 0.4 to 4 mol/l, and water, a molar ratio of the hydrofluoric acid to the hydrogen peroxide being from 1:1.5 to 1:2.8. The steel article is quench hardened and is chemically polished in the solution. A shot-peening is additionally performed, prior to the polishing.
REFERENCES:
patent: 3369914 (1968-02-01), Lacal
patent: 3992235 (1976-11-01), Gabarini
patent: 4459216 (1984-07-01), Nakazato et al.
patent: 4713123 (1987-12-01), Inokuti et al.
Aihara Hideo
Asano Takashi
Kajino Masaki
Ogawa Kazuyoshi
Ogino Mineo
Dang Thi
Kabushiki Kaisha Toyota Chuo Kenkyusho
Toyota Jidosha & Kabushiki Kaisha
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