Etching a substrate: processes – Forming or treating optical article
Patent
1996-05-15
1998-03-24
Breneman, R. Bruce
Etching a substrate: processes
Forming or treating optical article
216 66, 430 5, 359569, G02B 610, B44C 122
Patent
active
057308888
ABSTRACT:
A phase grating mask is placed in-contact or near contact with an optical waveguide to make a blazed grating in the waveguide. A band of grating elements are defined across a surface of the mask such that in the plane of the surface each element is formed at a predetermined blaze angle to a central longitudinal axis of the band. The grating is made by aligning the waveguide with the axis of the band and irradiating the phase mask. Gratings may be formed in a single step, or in several steps by moving the mask relative to the waveguide after each irradiation. The mask may be formed on a substrate by electron beam lithography.
REFERENCES:
patent: 4842633 (1989-06-01), Kuribayashi et al.
patent: 5116461 (1992-05-01), Lebby
patent: 5327515 (1994-07-01), Anderson et al.
patent: 5340637 (1994-08-01), Okai et al.
patent: 5367588 (1994-11-01), Hill et al.
Adjodha Michael E.
Breneman R. Bruce
Northern Telecom Limited
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