Both side projection exposure apparatus

Details Both side projection exposure apparatus Both side projection exposure apparatus

2006-02-21

2006-02-21

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Photographing on both sides of photo-sensitive paper

C355S053000

Reexamination Certificate

active

07002663

ABSTRACT:
In an exposure apparatus, an exposure stage is moved from an exposure position to a work piece feeding and discharging position, exposure light is emitted from a light emitting unit to a first alignment mark on a first mask and an image of the first alignment mark is projected on a first reflecting material, and a reflected image of the first alignment mark image is detected by the alignment microscope thereby detecting position of the first mask, and when the exposure stage is moved to a reversal handing over position, exposure light is emitted to a second alignment mark of a second mask from the light emitting unit, an image of a second alignment mark of a second mark is projected on a second reflecting material, and a reflected image of the projected second alignment mark image is detected by the alignment microscope thereby detecting position of the second mask.

REFERENCES:
patent: 5543890 (1996-08-01), Tanaka et al.
patent: 5881165 (1999-03-01), Tanaka
patent: 5923403 (1999-07-01), Jain
patent: 6198525 (2001-03-01), Barringer et al.
patent: 6459474 (2002-10-01), Okada
patent: 6545744 (2003-04-01), Zemel
patent: 2832672 (1998-10-01), None
patent: 2000-171980 (2000-06-01), None

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