Boron-doped amorphous carbon film for use as a hard etch...

Details Boron-doped amorphous carbon film for use as a hard etch... Boron-doped amorphous carbon film for use as a hard etch...

2005-08-29

2009-08-18

Nguyen, Thanh (Department: 2893)

Active solid-state devices (e.g., transistors, solid-state diode

Alignment marks

C257SE23179

Reexamination Certificate

active

07576441

ABSTRACT:
A hard mask comprising boron-doped amorphous carbon, and a method for forming the hard mask, provides improved resistance to etches of a variety of materials compared with previous amorphous carbon hard mask layers.

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