Boron-containing polishing system and method

Details Boron-containing polishing system and method Boron-containing polishing system and method

2006-02-21

2006-02-21

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S285000, C451S288000, C156S227000, C051S308000, C252S079100, C438S692000

Reexamination Certificate

active

07001253

ABSTRACT:
The invention provides a chemical-mechanical polishing system comprising an abrasive, a carrier, and either boric acid, or a conjugate base thereof, wherein the boric acid and conjugate base are not present together in the polishing system in a sufficient amount to act as a pH buffer, or a water-soluble boron-containing compound, or salt thereof, that is not boric acid, and a method of polishing a substrate using the chemical-mechanical polishing system.

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