Boride thin films on silicon

Details Boride thin films on silicon Boride thin films on silicon

2006-08-15

2006-08-15

Talbot, Brian K. (Department: 1762)

Coating processes

Electrical product produced

Superconductor

C427S255280, C029S599000, C505S473000, C505S732000

Reexamination Certificate

active

07090889

ABSTRACT:
Boride thin films of conducting and superconducting materials are formed on silicon by a process which combines physical vapor deposition with chemical vapor deposition. Embodiments include forming boride films, such as magnesium diboride, on silicon substrates by physically generating magnesium vapor in a deposition chamber and introducing a boron containing precursor into the chamber which combines with the magnesium vapor to form a thin boride film on the silicon substrates.

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