Boots – shoes – and leggings
Patent
1995-03-02
1997-07-01
Zimmerman, Mark K.
Boots, shoes, and leggings
364491, G06T 1740
Patent
active
056446888
ABSTRACT:
A method for simulating changes to the topography of a workpiece, e.g. a semiconductor wafer, as it undergoes process steps. The method may be used to simulated isotropic or anisotropic deposition or etch process steps. A solids modeling system is used to define and deform material solids. Material solids represent the different materials on a workpiece. A plurality of trajectory solids are constructed to cause the deformation of the material solids. Deformation of a material solid is accomplished through the performance of boolean operations between the material solid and one or more trajectory solids. A characteristic of a trajectory solid, e.g. a radius or height, relates to the rate of etch or deposition for the particular process step. The method of construction of trajectory solids in the present invention enables simulation of spatially varying process steps, avoids the creation of invalid self-intersecting surfaces and minimizes the creation of small edges that lead to irregular surfaces.
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Anderson Gregory
Leon Francisco A.
Tazawa Satoshi
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