Bonding structure and method of making

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S456000, C438S495000, C257SE23077, C257SE21567

Reexamination Certificate

active

07550365

ABSTRACT:
An electrical device includes an interconnect and a pair substrates at least one of which includes an integrated circuit, the pair of substrates being bonded together by a bond that includes a structure having multiple widths and a composition that is selected from the group consisting of a graded material and a first material upon a second material.

REFERENCES:
patent: 3852563 (1974-12-01), Bohorquez et al.
patent: 4329698 (1982-05-01), Smith
patent: 4438191 (1984-03-01), Cloutier et al.
patent: 4500895 (1985-02-01), Buck et al.
patent: 4651406 (1987-03-01), Shimizu et al.
patent: 4749291 (1988-06-01), Kobayashi et al.
patent: 4771295 (1988-09-01), Baker et al.
patent: 4794409 (1988-12-01), Cowger et al.
patent: 4847630 (1989-07-01), Bhaskar et al.
patent: 4851371 (1989-07-01), Fisher et al.
patent: 4875968 (1989-10-01), O'Neill et al.
patent: 4894664 (1990-01-01), Tsung Pan
patent: 4929969 (1990-05-01), Morris
patent: 4998665 (1991-03-01), Hayashi
patent: 5041190 (1991-08-01), Drake et al.
patent: 5084124 (1992-01-01), Taniguchi
patent: 5160577 (1992-11-01), Deshpande
patent: 5187500 (1993-02-01), Bohorquez et al.
patent: 5278584 (1994-01-01), Keefe et al.
patent: 5308442 (1994-05-01), Taub et al.
patent: 5317346 (1994-05-01), Garcia
patent: 5382505 (1995-01-01), Schmidt et al.
patent: 5443713 (1995-08-01), Hindman
patent: 5731828 (1998-03-01), Ishinaga et al.
patent: 5904546 (1999-05-01), Wood et al.
patent: 6219908 (2001-04-01), Farnworth et al.
patent: 6238998 (2001-05-01), Leobandung
patent: 6406636 (2002-06-01), Vaganov
patent: 6437400 (2002-08-01), Leobandung
patent: 6548322 (2003-04-01), Stemme et al.
patent: 6590258 (2003-07-01), Divakauni et al.
patent: 6673189 (2004-01-01), Gerss et al.
patent: 6969667 (2005-11-01), Liebeskind et al.
patent: 2004/0157407 (2004-08-01), Tong et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Bonding structure and method of making does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Bonding structure and method of making, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bonding structure and method of making will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4069923

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.