Boat for heat treatment

Heating – Accessory means for holding – shielding or supporting work...

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Details

432152, 432 5, 432241, F27D 500

Patent

active

058203672

ABSTRACT:
Support members are provided in a vertically spaced relation on a plurality of upright columns. A wafer support member comprises a projection formed to be annular along an inner peripheral edge of a ring and an outer wall formed along an outer peripheral edge thereof. The wafer is positively supported at a position inwardly of the outer peripheral edge thereof by the projection of the wafer support member despite the presence or absence of a warp thereof. Therefore, a load caused by the weight of the wafer is dispersed over the entire projection of the wafer support member. This suppresses the concentration of stress on a specific portion of the wafer support portion, and a surface defect called a slip generated when the wafer is heat treated can be eliminated.

REFERENCES:
patent: 5310339 (1994-05-01), Ushikawa
patent: 5458688 (1995-10-01), Watanabe
patent: 5482558 (1996-01-01), Watanabe et al.
patent: 5605574 (1997-02-01), Tsunashima et al.
patent: 5626680 (1997-05-01), Porter et al.

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