Blocked monomer and polymers therefrom for use as photoresists

Details Blocked monomer and polymers therefrom for use as photoresists Blocked monomer and polymers therefrom for use as photoresists

1991-10-25

1993-04-06

Schofer, Joseph L.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

548547, 526304, 5263075, 5263078, 526262, C07D40500, C07D207452, C08F 2058, C08F21208, C08F21614, C08F22240

Patent

active

052005291

ABSTRACT:
A new monomer is used to prepare homo or copolymers containing blocked imide groups which are characterized by deblocking in two stages, first when acid catalyzed and thereafter in aqueous alkaline solutions. Such polymers are, therefore, especially useful in formulating positive photoresist compositions. The polymers are combined with a latent photoacid, which when exposed to actinic radiation removes the acid sensitive blocking moiety, preferably an acetal or ketal group, leaving a methylol group or substituted methylol group remaining attached to the nitrogen atom, which groups are subsequently removed by exposure to aqueous alkaline developing solutions, leaving only imide groups. ##STR1## The new monomer is a derivative of maleimide in which the imide hydrogen has been replaced with a methylol group, which is subsequently reacted to form an acetal or ketal. Preferred monomers include N-(2,4-dioxa-3,3-dimethylpentyl)-2H,5H-2,5-dioxopyrrole and related compounds.

REFERENCES:
patent: 4205151 (1980-05-01), Dale et al.

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