Block exposure pattern data extracting system and method for cha

Details Block exposure pattern data extracting system and method for cha Block exposure pattern data extracting system and method for cha

1993-06-04

1996-12-31

Teska, Kevin J.

Boots, shoes, and leggings

364488, 364490, 364491, 382190, 382209, 25049222, G06F 1750, G06K 900

Patent

active

055900488

ABSTRACT:
In a block exposure pattern extracting system applied to a charged-particle beam exposure system having a block mask including a plurality of transparent stats having different shapes, a comparator unit compares first vectors connecting one of apexes of an input exposure pattern to other apexes thereof with second vectors connecting a reference point which is one of apexes of a unit block exposure pattern to other apexes of the unit block exposure pattern. A determining unit determines whether or not the first vectors coincide with the second vectors. An extracting unit extracts the input exposure pattern as the unit block exposure pattern when the determining unit determines that the first vectors coincide with the second vectors.

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Doerffer et al., "Time Efficient Method for MOS Circuit Extraction", 'IEEE Int'l Symposium on Circuits and Systems, May 1993, pp. 1983-1986.

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