Block copolymers and a novel method for preparing (co)polymers h

Details Block copolymers and a novel method for preparing (co)polymers h Block copolymers and a novel method for preparing (co)polymers h

1995-03-06

1997-03-11

Warzel, Mark

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526179, 525314, 525255, C08F 400

Patent

active

056102488

ABSTRACT:
The present invention concerns a novel method for preparing polymers (preferably (meth)acrylate polymers and copolymers) having a narrow molecular weight distribution by metal-free anionic polymerization in the presence of a phosphonium cation. The present invention also concerns block copolymers and methods of making the same using anionic polymerization in the presence of a phosphonium cation to prepare at least one block of the copolymer.

REFERENCES:
patent: 4849488 (1989-07-01), Starzewski et al.
patent: 5436280 (1995-07-01), Medsker, II et al.
Kondo et al., "Photoinitiated Polymerization of Methyl Methacrylate and Styrene by a Phosphorus Ylide", Journal of Polymer Sci., Plym. Lett. Ed., Mar. 1983, vol. 21, No. 3, pp. 217-222.

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