Block copolymer, method of making the same, diamine precursors o

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

528 22, 528 37, 528 38, C08G 7708

Patent

active

055126502

ABSTRACT:
Block copolymers having a repeating unit comprised of polysiloxane and urea segments are prepared by copolymerizing certain diaminopolysiloxanes with diisocyanates. The invention also provides novel diaminopolysiloxanes useful as precursors in the preparation of the block copolymers and methods of making such diaminopolysiloxanes. Pressure sensitive adhesive compositions comprising the block copolymer are also provided as are sheet materials coated with the same.

REFERENCES:
patent: 2737506 (1956-03-01), Hurd et al.
patent: 3044982 (1962-07-01), Jex et al.
patent: 3562352 (1971-02-01), Nyilas et al.
patent: 3890269 (1975-06-01), Martin
patent: 4203883 (1980-05-01), Hangaver
patent: 4439592 (1984-03-01), Maass
patent: 4518758 (1985-05-01), Cavezzan et al.
patent: 4528343 (1985-07-01), Kirn
patent: 4661577 (1987-04-01), Jo Lane et al.
patent: 4677182 (1987-06-01), Leir et al.
patent: 4766191 (1988-08-01), Gvozdic et al.
patent: 5214119 (1993-05-01), Leir etr al.
patent: 5276122 (1994-01-01), Aoki et al.
Chemistry and Technology of Silicones, by Walter Noll, published by the Academic Press, Inc., pp. 226-229 (1966).
Polymer, vol. 25, pp. 1800-1816, Dec. 1984.
Abstract No. 89-188438, Release agent for adhesive tape, etc. comprises resin having siloxane! segments, other release material and solvents.
Polymer, vol. 25, pp. 1800-1806, Dec. 1984 Iskender Yilgor, Ahmad K. Sha'aban, Warren P. Steckle, Jr. Dinesh Tyagi, Garth L. Wilkes and James E. McGrath.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Block copolymer, method of making the same, diamine precursors o does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Block copolymer, method of making the same, diamine precursors o, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Block copolymer, method of making the same, diamine precursors o will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-629602

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.