Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Reexamination Certificate
2008-01-15
2008-01-15
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
C430S287100, C430S281100, C430S306000, C430S907000, C430S286100, C522S110000
Reexamination Certificate
active
07318985
ABSTRACT:
A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking and which further has excellent thin-line reproducibility; a block copolymer composition for photosensitive flexographic plates which is suitable for use in the composition; and a flexographic plate obtained by exposing the composition to light. Also provided are: a block copolymer composition containing a three-branched aromatic vinyl/conjugated diene block copolymer obtained with a specific coupling agent; and a composition for photosensitive flexographic plates which comprises an ethylenic compound and a photopolymerization initiator.
REFERENCES:
patent: 5075377 (1991-12-01), Kawabuchi et al.
patent: 6025098 (2000-02-01), Sakurai et al.
patent: 6037101 (2000-03-01), Telser et al.
patent: 6326127 (2001-12-01), Morren et al.
patent: 2002/0001775 (2002-01-01), Knoll
patent: 2005/0137312 (2005-06-01), DuBois
patent: 696761 (1996-02-01), None
patent: 7-72795 (1995-08-01), None
patent: 8-69107 (1996-03-01), None
patent: 10-31303 (1998-02-01), None
patent: 10-73921 (1998-03-01), None
patent: 10-288838 (1998-10-01), None
patent: 2002-72457 (2002-03-01), None
patent: 2002-519465 (2002-07-01), None
patent: 2002-534714 (2002-10-01), None
Derwent- Acc-No. 1987-324793, Nippon Zeon KK Patent Family PUb No. JP 62231248 A, dated Oct. 9, 1987, two pages, English abstract.
Patent Abstracts of JAPAN Publication No. 62:231248, Nippon Zeon Co Ltd, Oct. 9, 1987, two pages, English Abstract.
English translation of JP, 10-073921, A (1998) from machine translation from AIPN Japan Patent Office Natinal center for Industrial Property Information and Training, generated Aug. 5, 2007, 11 pages.
Ikeda Shinya
Tsubaki Hidemi
Birch & Stewart Kolasch & Birch, LLP
Hamilton Cynthia
Zeon Corporation
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