Block copolyesters of polysiloxanes

Details Block copolyesters of polysiloxanes Block copolyesters of polysiloxanes

1974-09-24

1976-01-27

Jacobs, Lewis T.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

260 465R, 260824R, C08K 502

Patent

active

039351548

ABSTRACT:
Solvent soluble block copolyesters consisting essentially of units having the formula: ##EQU1## WHEREIN R is an alkylene radical containing at least 3 carbon atoms; R.sup.1 is an alkyl radical and R.sup.2 is an alkyl, alkaryl, aralkyl or aryl radical; A is an alkylene or arylene radical; a is an integer of at least 10; b is an integer of at least 1; c is an integer of at least 2; and d is an integer of at least 2; are formed by first reacting a dihalo-polydiorganosiloxane with a dihydric phenol or other diol and subsequently reacting the resulting reaction product with a dicarboxylic acid halide. These polymers are useful as release agents and leveling agents and find particular utility as abhesive materials for waterless lithographic printing plates.

REFERENCES:
patent: 3701815 (1972-10-01), Matzner et al.

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