Blind devices and methods for providing continuous...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000, C355S067000, C355S071000, C378S034000, C250S492200

Reexamination Certificate

active

07554648

ABSTRACT:
Blind devices and related methods for lithography systems are described. An exemplary system has a vacuum chamber with first and second chamber portions. In a member between the chambers is defined an exposure aperture, relative to which a reticle stage in the first chamber portion moves a reticle. A gas enters the first chamber portion and establishes a thermophoretic condition relative to the reticle or portion thereof. A fixed-blind-aperture assembly, movable relative to the exposure aperture and the reticle to exposure and non-exposure positions, defines an illumination aperture through which light from the second chamber portion and gas from the first chamber portion pass when the fixed-blind-aperture assembly is in the exposure position. A gas-passage aperture in the member conducts the gas, passing through the illumination aperture, from the first chamber portion to the second chamber portion when the fixed-blind-aperture assembly is in the non-exposure position.

REFERENCES:
patent: 6153044 (2000-11-01), Klebanoff et al.
patent: 6253464 (2001-07-01), Klebanoff et al.
patent: 7030959 (2006-04-01), Sogard
Rader et al., “Verification Studies of Thermophoretic Protection for EUV Masks,”Proceedings SPIE4688:182-193, 2002.

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