Blended grain direct-positive emulsions and photographic element

Details Blended grain direct-positive emulsions and photographic element Blended grain direct-positive emulsions and photographic element

1982-09-15

1984-04-24

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Diffusion transfer process, element, or identified image...

430940, 430567, 430503, 430598, 430603, 430605, 430564, 430409, 430410, G03C 102, G03C 136, G03C 700

Patent

active

044448651

ABSTRACT:
Blended emulsions for use in forming a direct-positive image are disclosed. The emulsions are comprised of a first, radiation-sensitive core-shell grain population having a relatively low coefficient of variation and a second, substantially smaller size grain population capable of internally trapping photolytically generated electrons. Photographic elements incorporating the blended emulsions exhibit improved covering power and can exhibit enhanced speed.

REFERENCES:
patent: 2456953 (1948-12-01), Knott et al.
patent: 2592250 (1952-04-01), Davey et al.
patent: 3206313 (1965-09-01), Porter et al.
patent: 3600180 (1971-08-01), Judd et al.
patent: 3615573 (1971-10-01), Smith et al.
patent: 3761276 (1973-09-01), Evans
patent: 3846128 (1974-11-01), Thomas et al.
patent: 3850637 (1974-11-01), Evans
patent: 3923513 (1975-12-01), Evans
patent: 4035185 (1977-07-01), Atwell et al.
Zelikman and Levi, Making and Coating Photographic Emulsions, Focal Press, 1964, pp. 234-238.

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