Blazed grating measurements of lithographic lens aberrations

Optics: measuring and testing – Lens or reflective image former testing – For optical transfer function

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G01B 900

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active

060914866

ABSTRACT:
Exposures of a photosensitive material through an array of blazed gratings illuminate a lens asymmetrically to detect effects of a plurality of azimuthal aberrations including coma, astigmatism, and three-leaf and four-leaf clover aberrations. A plurality of such exposures of the array of blazed gratings at slightly differing focus allows detection of focus shift due to any aberrations present in the lens. Upon development of the plurality of exposures, contrast of each area is measured, for example, by reflection or scattering from the relief in the developed photosensitive material and the aberrations thus detected can be simulated by effective summation of individual aberration effects.

REFERENCES:
patent: 5175594 (1992-12-01), Campbell
patent: 5300786 (1994-04-01), Brunner et al.
Joseph P. Kirk, "Astigmatism and Field Curvature from Pin-bars" SPIE vol. 1463 Optical/Laser Microlithography IV (1991), pp. 282-287.
Joseph P. Kirk, et al., "DUV Diagnostics Using Continuous Tone Photoresist" SPIE vol. 1463, Optical/Laser Microlithography IV (1991), pp. 575-579.

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