Blast media containing surfactant-clathrate compound

Details Blast media containing surfactant-clathrate compound Blast media containing surfactant-clathrate compound

1994-02-03

1995-01-10

Dean, Richard O.

Abrasive tool making process, material, or composition

Miscellaneous

51306, 51307, 51308, 51309, 134 6, 134 7, 252 91, B08B 700

Patent

active

053803477

ABSTRACT:
A blast media for stripping contaminants from a solid surface comprises abrasive particles and a surfactant in the form of a granular surfactant-clathrate compound formed of a surfactant and a water soluble compound having clathration capability such as urea. The surfactant reduces the amount of water soluble residues which remain on the targeted surface and enhances the removal of dirt, grease and oil from the targeted surface.

REFERENCES:
patent: 2605596 (1952-08-01), Uhri
patent: 2817195 (1957-12-01), Curtin
patent: 3142590 (1964-07-01), Hergonson
patent: 3607161 (1971-09-01), Monick
patent: 3764541 (1973-10-01), Kaneko
patent: 4125969 (1978-11-01), Easton
patent: 4347152 (1982-08-01), Wixon
patent: 4545155 (1985-10-01), Nakata
patent: 4731125 (1988-03-01), Carr
patent: 4802312 (1989-02-01), Glaeser et al.
patent: 4992198 (1991-02-01), Nebashi et al.
patent: 5112406 (1992-05-01), Lajoie et al.
patent: 5146716 (1992-09-01), Lynn
patent: 5160547 (1992-11-01), Kirschner et al.
patent: 5230185 (1993-07-01), Kirschner et al.
patent: 5308403 (1994-05-01), Yam et al
Advertisement-"Please Your Toughest Customer," Armex.RTM. Blast Media, Accustrip System.TM., .COPYRGT.1992, Church & Dwight Co., Ltd.

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