Blanking system for electron beam projection system

Details Blanking system for electron beam projection system Blanking system for electron beam projection system

1998-08-22

2000-02-08

Nguyen, Kiet T.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, H01J 3709

Patent

active

060230673

ABSTRACT:
A charged particle beam projection system includes a source of charged particles and a first doublet of condenser lenses with a first symmetry plane through which the beam is directed, located lower on the column. A trim aperture element is located at the first symmetry plane of the first doublet wherein the trim aperture serves as a first blanking aperture. Below the trim aperture there is a shaping aperture. Next is a second doublet of condenser lenses with a second symmetry plane. A third aperture, which is located at the symmetry plane of the second doublet serves as another blanking aperture.

REFERENCES:
patent: 5635719 (1997-06-01), Petric
patent: 5821542 (1998-10-01), Golladay
patent: 5856677 (1999-01-01), Okino

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