Blanking aperture array, method for producing blanking aperture

Details Blanking aperture array, method for producing blanking aperture Blanking aperture array, method for producing blanking aperture

1990-05-18

1992-09-01

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, 2504922, H01J 3747

Patent

active

051441420

ABSTRACT:
A blanking aperture array for use in a charged particle beam exposure has a substrate, at least m rows by n columns of apertures arranged two-dimensionally in the substrate, where each of the apertures have a pair of blanking electrodes and m and n are integers greater than one, and n m-bit shift registers provided on the substrate for applying voltages dependent on pattern data to m pairs of the blanking electrodes of the apertures in the ith column, where i=1, 2, . . . , n. The pattern data is relates to a pattern which is to be exposed using the blanking aperture array.

REFERENCES:
patent: 4130761 (1978-12-01), Matsuda
patent: 4153843 (1979-05-01), Pease
patent: 4409487 (1983-10-01), Kuschel et al.
patent: 4472636 (1984-09-01), Hahn
patent: 4633090 (1986-12-01), Hahn
patent: 4724328 (1988-02-01), Lischke
patent: 4859520 (1989-06-01), Garth
patent: 4980567 (1990-12-01), Yasuda et al.
patent: 4982099 (1991-01-01), Lischke

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