Blanking aperture array and charged particle beam exposure metho

Details Blanking aperture array and charged particle beam exposure metho Blanking aperture array and charged particle beam exposure metho

1992-12-16

1993-11-16

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437924, 437935, H01L 21268

Patent

active

052623416

ABSTRACT:
A blanking aperture array for use in a charged particle beam exposure has a substrate, at least m rows by n columns of apertures arranged two-dimensionally in the substrate, where each of the apertures have a pair of blanking electrodes and m and n are integers greater than one, and n m-bit shift registers provided on the substrate for applying voltages dependent on pattern data to m pairs of the blanking electrodes of the apertures in the ith column, where i=1, 2, . . . , n. The pattern data is related to a pattern which is to be exposed using the blanking aperture array.

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European Search Report, The Hague, search completed May 1991.

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