Black matrix material and methods related thereto

Details Black matrix material and methods related thereto Black matrix material and methods related thereto

1997-04-07

2000-09-12

Mayekar, Kishor

Chemistry: electrical and wave energy

Processes and products

Electrophoresis or electro-osmosis processes and electrolyte...

204486, 204490, 204491, 427 64, 427157, 445 50, C25D 1302

Patent

active

061172944

ABSTRACT:
A black matrix material for increasing resolution and contrast of field emission displays is disclosed. The black matrix material is preferably deposited by electrophoresis in the interstitial regions between phosphor pixels of the faceplate. By this technique, high resolution and/or small surface area field emission displays may be manufactured. The black matrix material does not brown when subjected to the conditions associated with the manufacture of field emission displays, is chemically inert and remains stable under vacuum conditions and electron bombardment. The black matrix material is selected from boron carbide, silicon carbide, tungsten carbide, vanadium carbide and mixtures thereof.

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