Black matrix laminated film and reactive sputtering apparatus

Details Black matrix laminated film and reactive sputtering apparatus Black matrix laminated film and reactive sputtering apparatus

1997-04-22

1999-07-13

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429823, C23C 1434

Patent

active

059221810

ABSTRACT:
It is an object of the present invention is to provide a color liquid crystal display depicting clear images on the screen by decreasing the reflectance of external light such as solar light and room light on the black matrix. A black matrix including a laminated film is provided. The laminated film includes at least two layers each of which include at least two constituent elements. One layer is a transition layer in which the content of one of the constituent elements increases along an incident direction of external light. Also provided is a reactive sputtering apparatus suitable for preparing the laminated film for the black matrix of the present invention.

REFERENCES:
patent: 4309261 (1982-01-01), Harding
patent: 4871434 (1989-10-01), Munz et al.
patent: 4975168 (1990-12-01), Ohno et al.
patent: 5108571 (1992-04-01), Ludwig et al.
patent: 5427665 (1995-06-01), Hartig et al.

Affiliated with

Also associated with

Rating

Black matrix laminated film and reactive sputtering apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Black matrix laminated film and reactive sputtering apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Black matrix laminated film and reactive sputtering apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2272760