Bistable resistance value acquisition device, manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Bulk effect device – Bulk effect switching in amorphous material

Reexamination Certificate

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C257SE29002, C438S102000, C438S103000, C365S163000, C365S001000

Reexamination Certificate

active

07875872

ABSTRACT:
A ferroelectric layer (104) is sandwiched between a lower electrode layer (103) and an upper electrode (105). When a predetermined voltage (DC or pulse) is applied between the lower electrode layer (103) and the upper electrode (105) to change the resistance value of the ferroelectric layer (104) to switch a stable high resistance mode and low resistance mode, a memory operation is obtained. A read can easily be done by reading a current value when a predetermined voltage is applied to the upper electrode (105).

REFERENCES:
patent: 3795977 (1974-03-01), Berkenblit et al.
patent: 3796926 (1974-03-01), Cole et al.
patent: 5811181 (1998-09-01), Kijima et al.
patent: 7099141 (2006-08-01), Kaufman et al.
patent: 2005/0111256 (2005-05-01), Bednorz et al.
patent: 101 04 611 (2002-08-01), None
patent: 1 335 417 (2003-08-01), None
patent: 1 628 352 (2006-02-01), None
patent: 49-034390 (1974-09-01), None
patent: 50-004986 (1975-01-01), None
patent: 07-263646 (1995-10-01), None
patent: 07-326683 (1995-12-01), None
patent: 08-031960 (1996-02-01), None
patent: 08-161933 (1996-06-01), None
patent: 08-306806 (1996-11-01), None
patent: 08306806 (1996-11-01), None
patent: 09-092792 (1997-04-01), None
patent: 2779997 (1998-05-01), None
patent: 10-152397 (1998-06-01), None
patent: 10-152398 (1998-06-01), None
patent: 2814416 (1998-08-01), None
patent: 10-341002 (1998-12-01), None
patent: 11-231349 (1999-08-01), None
patent: 2001-237387 (2001-08-01), None
patent: 2003-077911 (2003-03-01), None
patent: 2005-167064 (2005-06-01), None
patent: 2005-347468 (2005-12-01), None
patent: 2006-019444 (2006-01-01), None
patent: 0055794 (1992-05-01), None
patent: WO 00/49659 (2000-08-01), None
Beck et al.(“Reproducible switching effect in thin oxide films for memory applications” Applied Physics Letters, vol. 77, No. 1, Jul. 2000, p. 139).
Watanabe et al (“Current-driven insulator-conductor transition and nonvolatile memory in chromium-doped SrTiO3 single crystals” Applied Physics Letters, vol. 78, No. 23, Jun. 2001 p. 3738).
Rossel et al (“Electrical current distribution across a metal-insulator-metal structure during bistable switching”, Journal of Applied Physics, vol. 90, No. 6, Sep. 2001, p. 2892).
Sze, “Physics of Semiconductor Devices”, Jhon Wiley and Sons, Inc., 1981.
Matsuoka, “Applied Physics”, vol. 73 No. 9, pp. 1166, 2004, Abstract.
“Development and Application of Ferroelectric Materials”, edited by Tadashi Shiosaki, CMC Co., Ltd, Abstract.
Inomata et al., “MRM Technology—from Fundamentals to LSI Applications”, SIPEC Abstract.
Amazawa et al., “Ultrathin oxidefilms deposited using electron cyclotron resonance sputter”, J. Vac. Sci. Technol., B 17, No. 5.
Matsuoka et al., “Low-temperature epitaxial growth of BaTIO3 films by radio-frequency-mode electron cyclotron re3sonance sputtering”, J. Appl. Phys., 76(3), 1768 (1994).
Watazu et al., “Powder and Powder Metallurgy ”, No. 44, pp. 86, 1997, Abstract.
Masumoto et al., “Preparation of Bi4Ti3O12 films on a single-crystal sapphire substrate with electron cyclotron resonance plasma sputtering”, Appl. Phys. Lett., 58, 243 (1991).
Yamaguchi et al., “Effect of Grain Size on Bi4Ti3O12 Thin Film Properties”, Jpn. J. Appl. Phys., vol. 37, (1998) pp. 5166-5170.
Wild et al., “Hafnium and Zirconium silicates for advanced gate dielectrics”, J. Appl. Phys., vol. 87, No. 1, Jan. 2000, pp. 484-492.

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