Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing
Patent
1995-10-04
1997-11-11
Chea, Thorl
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Antihalation or filter layer containing
544113, 544116, 544216, G03C 1815, C08K 53492
Patent
active
056862334
ABSTRACT:
Compounds of the formula I ##STR1## in which R.sub.1 and R.sub.5, independently of one another, are C.sub.1 -C.sub.12 alkyl; R.sub.2, R.sub.3 and R.sub.4, independently of one another, are H; C.sub.1 -C.sub.12 alkyl; C.sub.2 -C.sub.6 alkenyl; C.sub.1 -C.sub.12 alkoxy; C.sub.2 -C.sub.18 alkenyloxy; halogen; trifluormethyl; C.sub.7 -C.sub.11 phenylalkyl; phenyl; phenyl which is substituted by C.sub.1 -C.sub.18 alkyl, C.sub.1 -C.sub.18 alkoxy or halogen; phenoxy; or phenoxy which is substituted by C.sub.1 -C.sub.18 alkyl, C.sub.1 -C.sub.18 alkoxy or halogen; the two radicals R.sub.7 are identical or different and are hydrogen or C.sub.1 -C.sub.18 alkyl; or are C.sub.1 -C.sub.18 alkyl which is substituted by OH, C.sub.1 -C.sub.18 alkoxy, C.sub.3 -C.sub.6 alkenyloxy, halogen, --COOH, --COOR.sub.8, --CONH.sub.2, --CONHR.sub.9, --CON(R.sub.9)(R.sub.10), --NH.sub.2, --NHR.sub.9, --N(R.sub.9)(R.sub.10), --NHCOR.sub.11, --CN, --OCOR.sub.11, phenoxy and/or phenoxy which is substituted by C.sub.1 -C.sub.18 alkyl, C.sub.1 -C.sub.18 alkoxy or halogen; or the radicals R.sub.7 are C.sub.3 -C.sub.50 alkyl which is interrupted by --O-- and may be substituted by OH, phenoxy or C.sub.7 -C.sub.18 alkylphenoxy; or the radicals R.sub.7 are C.sub.3 -C.sub.6 alkenyl; glycidyl; C.sub.5 -C.sub.12 cycloalkyl; C.sub.5 -C.sub.12 cycloalkyl which is substituted by OH, C.sub.1 -C.sub.4 alkyl oder --OCOR.sub.11 ; C.sub.7 -C.sub.11 phenylalkyl which is unsubstituted or substituted by OH, Cl or CH.sub.3 ; C.sub.4 -C.sub.14 alkenyl which is substituted by OH or --OCOR.sub.11 ; --CO--R.sub.12 or --SO.sub.2 --R.sub.13 ; and R.sub.8 to R.sub.14 are as defined in claim 1, are highly suitable for stabilizing organic material, including photographic recording material.
REFERENCES:
patent: 3244708 (1966-04-01), Duennenberger
patent: 3249608 (1966-05-01), Beland et al.
patent: 3645743 (1972-02-01), Mucke et al.
patent: 3843371 (1974-10-01), Peller et al.
patent: 4220765 (1980-09-01), Findeisen
patent: 4619956 (1986-10-01), Susi
patent: 4826978 (1989-05-01), Migdal et al.
patent: 5364749 (1994-11-01), Leppard et al.
patent: 5438840 (1995-08-01), Toan et al.
patent: 5489503 (1996-02-01), Toan
Chem. Abst. 90534r vol. 72 1970 of Swiss 480,090.
Chem. Abst. 121590m vol. 72 1970 of Swiss 484,695.
Chemical Abstract 213920n--European Patent Application EP 530,135.
Birbaum Jean-Luc
Knupp Walter
Toan Vien Van
Valet Andreas
Chea Thorl
Ciba-Geigy Corporation
Hall Luther A. R.
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