Bis ethers containing a 2,2'-biaryl radical and a process for th

Details Bis ethers containing a 2,2'-biaryl radical and a process for th Bis ethers containing a 2,2'-biaryl radical and a process for th

1997-06-20

1999-02-23

Kumar, Shailendra

Organic compounds -- part of the class 532-570 series

Organic compounds

Oxygen containing

585400, 564305, C07C 4303

Patent

active

058746420

ABSTRACT:
The present invention relates to compounds of the formula (I) ##STR1## in which R.sup.1, R.sup.2 and R.sup.3 are identical or different and, independently of one another, are hydrogen, an alkyl or alkoxy group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, or R.sup.1 and R.sup.2 including the respective carbon atoms bound to them form a ring containing 6 carbon atoms, m and n independently of one another are 0 or 1 and (m+n) is 1 or 2, and R is an unsubstituted phenyl or naphthyl radical, or a phenyl or naphthyl radical substituted by an alkyl group having 1 to 4 carbon atoms or an amino or dialkylamino group containing a total of 2 to 8 carbon atoms, and to a process for their preparation.

REFERENCES:
patent: 3527809 (1970-09-01), Pruett et al.
patent: 3917661 (1975-11-01), Pruett et al.
T.N. Sorrell, "3,3'-Disubstituted 2,2'-biphenols: Synthesis of Nonplanar, Tetradentate Chelating Ligands" Journal of Organic Chemistry, Bd. 50, Nr. 26, 27, pp. 5764-5769, Dec. 1985.
J. Van Alphen, "Dimorphism of Tetranitrodiphenyl Derivatives", Recueil Des Travaux Chimiques Des Pays-Bas, Bd. Li, Nr. 5, pp. 453-459, May 15, 1932.

Affiliated with

Also associated with

Rating

Bis ethers containing a 2,2'-biaryl radical and a process for th does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Bis ethers containing a 2,2'-biaryl radical and a process for th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bis ethers containing a 2,2'-biaryl radical and a process for th will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-308993