Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-02-04
1988-09-27
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, 534556, 534557, 534561, G03C 154, C07C11300
Patent
active
047741716
ABSTRACT:
Novel bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides of secondary diamines, which amides are represented by the formula ##STR1## in which R is a straight-chain or branched, unsubstituted or hydroxyl-substituted alkyl, cycloalkyl or aralkyl radical which has 1 to 14 carbon atoms and which includes a carbon chain that can be interrupted by either oxygen atoms,
REFERENCES:
patent: 3046110 (1962-07-01), Schmidt
patent: 3046122 (1962-07-01), Sus
patent: 3046123 (1962-07-01), Sus et al.
patent: 3687663 (1972-08-01), Bloom
patent: 4397937 (1983-08-01), Clecak et al.
patent: 4409314 (1983-10-01), Buhr et al.
Buhr Gerhard
Zahn Wolfgang
Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
LandOfFree
Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2397681