Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer
Patent
1999-05-24
2000-10-10
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaged product
Multilayer
430950, G03E 500
Patent
active
061300136
ABSTRACT:
A method for attenuating within a microelectronics fabrication a standing wave photoexposure of a photoresist layer formed upon a reflective layer, and a microelectronics fabrication employed within the method. To practice the methods there is first provided a substrate employed within a microelectronics fabrication. There is then formed over the substrate a reflective layer. There is then formed upon the reflective layer a birefringent material layer. The birefringent material layer attenuates a standing wave photoexposure of a photoresist layer subsequently formed upon the birefringent material layer, where the photoresist layer is subsequently photoexposed with an actinic photoexposure radiation beam.
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Shiraishi, Kazuo, Fabrication of Spatial Walk-Off Polarizing Films by Oblique Deposition, IEEE Journal of Quantum Electronics, vol. 30, No. 10, pp. 2417-2420, Oct. 1994.
Ackerman Stephen B.
Duda Kathleen
Saile George O.
Szecsy Alek P.
Taiwan Semiconductor Manufacturing Company
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