Birefringence optical element and manufacturing method thereof

Details Birefringence optical element and manufacturing method thereof Birefringence optical element and manufacturing method thereof

2007-06-05

2007-06-05

Lavarias, Arnel (Department: 2872)

Optical: systems and elements

Diffraction

From grating

C359S566000, C359S486010, C359S494010

Reexamination Certificate

active

10901633

ABSTRACT:
A mask with an opening pattern is placed on a substrate, and etching is carried out by use of anisotropy etching of crystal. The opening pattern of the mask is composed of broken lines, each of which is discontinued by discontinuing portions. By the etching, a birefringence optical element with a fine structure, in which trenches, each of which is discontinued by discontinuing portions, are juxtaposed periodically at a specified pitch, is obtained.

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patent: 6927915 (2005-08-01), Nakai
patent: 2003/0164534 (2003-09-01), Urakami et al.
patent: 2006/0061862 (2006-03-01), Mi et al.
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patent: 06-122510 (1996-06-01), None
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Figs. 10-13b of U.S. Appl. No. 10/901,633, filed Jul. 29, 2004.

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