Bipolar transistor with self-aligned retrograde extrinsic...

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure – With base region having specified doping concentration...

Reexamination Certificate

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Details

C257SE29184, C257SE29182, C257SE29183, C257S587000, C438S366000, C438S374000, C438S376000

Reexamination Certificate

active

10904437

ABSTRACT:
Disclosed is a method of forming a transistor in an integrated circuit structure that begins by forming a collector in a substrate and an intrinsic base above the collector. Then, the invention patterns an emitter pedestal for the lower portion of the emitter on the substrate above the intrinsic base. Before actually forming the emitter or associates spacer, the invention forms an extrinsic base in regions of the substrate not protected by the emitter pedestal. After this, the invention removes the emitter pedestal and eventually forms the emitter where the emitter pedestal was positioned.

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patent: 5428243 (1995-06-01), Wylie
patent: 5656514 (1997-08-01), Ahlgren et al.
patent: 6239477 (2001-05-01), Johnson
patent: 6531720 (2003-03-01), Freeman et al.
patent: 6534372 (2003-03-01), Racanelli
patent: 6551891 (2003-04-01), Chantre et al.
patent: 6846710 (2005-01-01), Yi et al.
patent: 2002/0153535 (2002-10-01), Freeman et al.
patent: 2003/0082882 (2003-05-01), Babcock et al.

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