Bipolar transistor having self-aligned silicide and a...

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure – With enlarged emitter area

Reexamination Certificate

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C257S587000, C257S588000, C257S592000

Reexamination Certificate

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07466010

ABSTRACT:
The present invention provides a bipolar transistor having a raised extrinsic base silicide and an emitter contact border that are self-aligned. The bipolar transistor of the present invention exhibit reduced parasitics as compared with bipolar transistors that do not include a self-aligned silicide and a self-aligned emitter contact border. The present invention also is related to methods of fabricating the inventive bipolar transistor structure. In the methods of the present invention, a block emitter polysilicon region replaces a conventional T-shaped emitter polysilicon.

REFERENCES:
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patent: 6177717 (2001-01-01), Chantre et al.
patent: 6248650 (2001-06-01), Johnson
patent: 6399993 (2002-06-01), Ohnishi et al.
patent: 6767798 (2004-07-01), Kalnitsky et al.
patent: 6979884 (2005-12-01), Ahlgren et al.
patent: 2002/0158311 (2002-10-01), Ohnishi et al.
patent: 2002/0168829 (2002-11-01), Bock et al.
patent: 2003/0193077 (2003-10-01), Fujii
patent: 2003/0227071 (2003-12-01), Chen

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