Bipolar semiconductor device and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Bipolar transistor

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257584, 257586, 257587, H01L 310328

Patent

active

059230576

ABSTRACT:
A method for fabricating a bipolar device, including the steps of forming an epitaxial growth retarding layer on a substrate at a predetermined angle, forming a collector layer on the substrate so that the collector layer is adjacent the epitaxial growth retarding layer and has an inclined portion formed over an edge portion of the epitaxial growth retarding layer, forming a base layer having an inclined portion on the collector layer, and forming an emitter layer on the inclined portion of the base layer.

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patent: 5374846 (1994-12-01), Takemura
patent: 5412233 (1995-05-01), Dubon-Chevallier et al.
patent: 5629556 (1997-05-01), Johnson
patent: 5648666 (1997-07-01), Tran et al.
Internatinal Electron Devices meeting, The Technical Digest, Dec. 13-16, 1992; pp. 4.4.1-4.4.4.

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