Bipolar plate hydrophilic treatment for stable fuel cell...

Chemistry: electrical current producing apparatus – product – and – Fuel cell – subcombination thereof – or method of making or... – Grouping of fuel cells into stack or module

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C429S452000, C427S115000, C216S083000

Reexamination Certificate

active

08053133

ABSTRACT:
A flow field plate or bipolar plate for a fuel cell that includes a hydrophilic coating formed on flow field channels extending through a tunnel region between a cell active area and the inlet and outlet manifolds. The flow field plates are an assembly of a cathode side unipolar plate and an anode side unipolar plate. The hydrophilic coating is deposited on the unipolar plates prior to the unipolar plates being assembled into the flow field plate so that line of site deposition processes can be used to coat the flow field channels in the tunnel region. The unipolar plates can be any suitable fuel cell unipolar plates, such as stamped unipolar plates or composite unipolar plates.

REFERENCES:
patent: 2006/0194095 (2006-08-01), Vyas et al.
patent: 2006/0216570 (2006-09-01), Vyas et al.
patent: 2006/0216571 (2006-09-01), Vyas et al.
patent: 2006/0257711 (2006-11-01), Elhamid et al.
patent: 2007/0134541 (2007-06-01), Arisaka et al.
patent: 2008/0076004 (2008-03-01), Rodak et al.
patent: 101044649 (2007-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Bipolar plate hydrophilic treatment for stable fuel cell... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Bipolar plate hydrophilic treatment for stable fuel cell..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bipolar plate hydrophilic treatment for stable fuel cell... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4301630

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.