Bipolar junction transistor exhibiting improved beta punch-throu

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure – With base region having specified doping concentration...

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257273, 257593, H01L 2973, H01L 2970

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active

053861400

ABSTRACT:
A bipolar transistor having an emitter, a base, and a collector includes an intrinsic base region having narrow side areas and a wider central area. The side areas are located adjacent to the extrinsic base region, while the central area is disposed underneath the emitter. The lateral doping profile of the base is tailored so that the doping concentrations in the extrinsic region and the central area are relatively high compared to the doping concentration of the narrow side areas of the intrinsic base. The combination of the narrow side areas and the lateral base doping profile constrains the depletion region within the base thereby lowering punch-through voltage of the transistor without loss of beta.

REFERENCES:
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patent: 4667393 (1987-05-01), Ferla et al.
patent: 4946798 (1990-08-01), Kawakatsu
patent: 4996581 (1991-02-01), Hamasaki
patent: 5140400 (1992-08-01), Morishita
S. M. Sze; "Semiconductor Devices Physics and Technology"; 1985; pp. 110-111.
Warnock et al; "50 GHz Self-Aligned Silicon Bipolar Transistors with Ion Implanted Base Profiles"; IEEE Electron device letters, vol. 11; Oct. 1990.

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