Bipolar fabrication method

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 28, 148DIG10, H01L 21265

Patent

active

052448215

ABSTRACT:
A method for forming a bipolar transistor is disclosed. An optional thin screen oxide (.apprxeq.150 .ANG.) may be formed upon a substrate over an already-defined collector region. A BF.sub.2 or other implantation is performed through the screen oxide to create the base. The screen oxide is removed and replaced with a patterned high pressure oxide so that the emitter may be defined. The resulting device has a more controllable Gummel number and breakdown voltage.

REFERENCES:
patent: 3756861 (1973-09-01), Payne et al.
patent: 4236294 (1980-12-01), Anantha et al.
patent: 4764482 (1988-08-01), Hsu
patent: 4839302 (1989-06-01), Kameyama et al.
patent: 4874712 (1989-10-01), Kim et al.
patent: 4927775 (1990-05-01), Alvarez et al.
patent: 4983531 (1991-01-01), Cosentino
patent: 4997775 (1991-03-01), Cook et al.
patent: 5008208 (1991-04-01), Liu et al.
patent: 5013671 (1991-05-01), Havemann
patent: 5013672 (1991-05-01), Zambrano

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Bipolar fabrication method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Bipolar fabrication method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bipolar fabrication method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2026096

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.