Biocides and apparatus

Details Biocides and apparatus Biocides and apparatus

2005-02-14

2010-11-23

Landau, Sharmila Gollamudi (Department: 1611)

Liquid purification or separation

Processes

Chemical treatment

C210S764000, C514S476000, C514S561000, C424S405000

Reexamination Certificate

active

07837883

ABSTRACT:
There are provided methods for controlling microbial or bioflim growth, comprising mixing a hypochlorite oxidant and at least one nitrogen-containing compound or salt thereof selected from a particular group of nitrogen-containing compounds and salts to form a biocide, and applying the biocide. Apparatus for practicing the methods are also provided.

REFERENCES:
patent: 3344018 (1967-09-01), Shibe et al.
patent: 4476930 (1984-10-01), Watanabe
patent: 5795487 (1998-08-01), Dallmier et al.
patent: 5976386 (1999-11-01), Barak
patent: 6110387 (2000-08-01), Choudhury et al.
patent: 6132628 (2000-10-01), Barak
patent: 6429181 (2002-08-01), Sweeny et al.
patent: 6478972 (2002-11-01), Shim et al.
patent: 6533958 (2003-03-01), Shim et al.
patent: 2003/0121868 (2003-07-01), Barak
patent: 0517102 (1992-09-01), None
patent: 1600289 (1982-10-01), None
Burrows et al, “The equilibrium between ammonium carbonate and ammonium carbamate in aqueous solution at 25°,” Publication of the Research Laboratory of Physical Chemistry, Massachusetts Institute of Technology, Boston, Mass., No. 84, pp. 993-995 (Jun. 12, 1912).
Fenton, “On the limited hydration of ammonium carbamate,” Chem. Sco. Jour. 33, 300, pp. 386-393 (Dec. 10, 1885).
Wen et al , “Ammonium Carbonate, Ammonium Bicarbonate, and Ammonium Carbamate Equilibria: a Raman Study,” J. Phys. Chem, vol. 99, No. 1, pp. 359-368 (1995).

Affiliated with

Also associated with

Rating

Biocides and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Biocides and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Biocides and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4200214