Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-07-06
1984-09-18
Bowers, Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430155, 430166, 430167, 430175, 430176, 430271, 430300, 430325, 430326, 430533, 430534, 430535, 430 5, 430293, G03C 160, G03F 708, G03F 702
Patent
active
044724942
ABSTRACT:
Bilayer photosensitive imaging articles comprising a substrate coated with an image layer and a resist layer are disclosed. The substrate may be transparent, translucent or opaque to give imaging articles useful in different applications. The image layer which should be from about 0.3-3.0 microns in thickness includes an organic film-forming vehicle from the group of copolymers of the formula: ##STR1## where P is styrene, ethylene or methyl vinyl ether; m is 1-3; n is 1,10; X is OH, OHN.sub.2, ONH.sub.4, OR, ONH.sub.3 R, ONH.sub.2 R.sub.2, ONHR.sub.3, ONH.sub.3 RNH.sub.2, ONa, OK, OLi; R is an alkyl group in the range C.sub.1 -C.sub.10 optionally including a functional group such as ketone, alcohol, esther, ether alcohol or aryl; m=1-3, n=1-10; and the molecular weight is between 1,000-150,000. The image layer may also include a coloring medium. The resist layer, which should be from about 0.5 to about 2.0 microns in thickness, comprises a material which, upon exposure to actinic radiation, changes solubility with respect to a developer in which the imager layer is also soluble. The resist layer may be negative-working or positive working.
In an important embodiment of the invention, the chemical composition and physical parameters of imaging articles particularly suited to the production of half-tone images capable of subsequent etching are disclosed. These imaging articles exhibit unexpectedly excellent exposure and development latitude accompanied by outstanding etchability.
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Bohannon Ronald G.
Hallman Robert W.
Langlais Eugene L.
Rubic Dominic B.
Bowers Charles L.
Napp Systems (USA) Inc.
Scavone Thomas G.
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